Samsung and nova publish joint research at spie advanced lithography conference

Demonstrating in-line capabilities of spectral interferometry and raman spectroscopy for advanced memory applications rehovot, israel , feb. 27, 2024 /prnewswire/ -- nova (nasdaq: nvmi) today announced that it will publish two co-authored papers with samsung r&d center research at spie advanced lithography 2024. the papers will be presented at the spie by nova and samsung, at the metrology, inspection and process control conference.
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